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U8. Micro/Nanotechnology Unit – Equipment

U8. Micro/Nanotechnology Unit – Equipment

U8-E10. Encapsulation equipment

Encapsulation equipment.

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U8-E09. Optical (SEM) and electrical (Impedance) characterization equipment

Optical (SEM) and electrical (Impedance) characterization equipment.

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U8-E08. Nanolithography equipment

Nanolithography equipment

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U8-E07. RIE and DRIE equipment

RIE and DRIE equipment.

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U8-E06. Chemical banks for micro/nanotechnologies

Chemical banks for micro/nanotechnologies.

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U8-E05. CVD nitride and oxide passivation equipment

CVD nitride and oxide passivation equipment.

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U8-E04. Optical photolithography equipment

Optical photolithography equipment.

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U8-E03. Platinum and gold deposition equipment

Platinum and gold deposition equipment.

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U8-E02. Thermal oxidation process equipment.

Thermal oxidation process equipment.

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U8-E01. Chemical vapor deposition (CVD) equipment for growth of CNTs and Graphene, Black Magic Pro 4-inch System ( AIXTRON Ltd)

The CVD machine grows both single and multiwalled carbon nanotubes, using both plasma-enhanced CVD (PECVD) and/or thermal CVD. It enables the production of advanced CNT Micro-Nano-Bio Systems (MNBS) for biological, chemical or biochemical analysis. As the suitability of the interface of any MNBS device is a critical point, the selective growth of CNT improves the electrode-electrolyte interface enhancing the biomonitoring.
Its specifications are:
›› Heat processing control up to 900ºC, with controlled ramps of up to 300ºC/min.
›› Plasma control; completely configurable source. Possibility of working without plasma.
›› Camera for 4” wafers.
›› Camera for following the process.
›› Possibility of processes in high vacuum (5 mBar) and at atmospheric pressure (800 mBar).
›› Process gases: hydrogen, methane, acetylene, argon,
ammonium and air.

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