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U7. Nanotechnology Unit

U7. Nanotechnology Unit

U7-S07. Photolithography and soft-lithography manufacturing processes (On-site&Remote) OUTSTANDING

Fabrication of structures on diferent substrates, with diferent sizes and features by using diferent techniques such as: RIE, wet etching, etc.

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U7-S06. NIL – Nanoimprint Lithography (On-site&Remote) SINGULAR

Replication of nanostructures on polymers using controlled pressure and temperature. The sructres can be cured by heat (Thermal NIL) or UV light (step-and-flash lithography – SFIL) during the imprinting process.
This technique is widely used for microstructure fabrication for electrical, optical, photonic and biological applications.

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U7-S04. Lytography by e-beam (On-site&Remote) OUTSTANDING

Manufacturing of micro- and nano-structures using e-beam lithography in combination with other cleanroom techniques.

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U7-S03. Characterization by SEM (On-site&Remote) OUTSTANDING

Topographical and morphological characterization of samples (nanostructures, materials, cells, tissues, etc.).

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U7-S01. Training Courses in the Use of nanotechnology equipment (Onsite)

Training in the use of: interferometer, optical microscop, spin-coater, plasma cleaner and UV optical litography

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