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U7. Nanotechnology Unit

U7. Nanotechnology Unit

U7-E06. Thermal and e-beam metal evaporator

• Electron-beam evaporator

Univex 450B (Oerlikon Leybold Vacuum, Germany)
Adapted for sputtering, thermal evaporation and electron beam processes.
Thin film coatings can be deposited on a wide variety of substrate materials such as: metals, plastics, semiconductors, ceramics and glass.
Substrate sizes that can be accommodated in the machine range anywhere from 1mm (any shape) up to 254mm (diameter).

Evaporation:
• The system contains two material pockets for deposition of single and multilayers.
Electron Beam Physical Vapor Deposition or EBPVD
• The system contains four material pockets for deposition of single and multilayers.
Sputtering
• DC sputtering for conducting materials. Up to 1000W
• RF sputtering for dielectric materials. Up to 600W

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U7-E05. Wet Bench

• Wet Etching

Chemical bath system with several baths built into a safety cabinet made of anti-corrosive material (polypropylene). The cabinet is a closed unit and incorporates a ventilation system.
With the chemical bath system we can easily adapt the contents according to the requirements of the process, taking into account the polymer, resins or material to be etched.

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U7-E04. Laser Lithography (Mask Plotter)

• Laser Lithography (Mask Plotter)

•- Optical autofocus using 4 mm write head.
•- Minimum feature size: 1.0 µm (200 nm pixel size, 5.7 mm2/min writing speed).
•- Expose small parts samples up through 8” wafers, including masks blanks for photomask fabrication.
•- Diode laser: 405 nm wavelength, 50 mW max. power.
•- Back to front side alignment (alignment accuracy: 250 nm).
•- Grayscale exposure for 3D structures.
•- Stability of the system ensured by a climate chamber that provides constant temperature (±0.1°C).
•- Equipped with an interferometer stage for maximum alignment accuracy.
•- The conversion software accepts standard CAD formats: CIF, DXF and GDSII.

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U7-E03. UV optical Lithography (Mask Aligner)

• UV optical Lithography (Mask Aligner)

MJB4 Mask Aligner (SÜSS Microtech, Munich, Germany) is a precision instrument for high-resolution photolithography and is intended for use in research laboratories, small-series production and pilot projects.
The flexibility of the MJB4 is unsurpassed when exposing standard wafers and substrates and irregularly shaped substrates with a diameter of up to 100 mm or 4”x4” and various thicknesses.

• Hg lamp, 305nm to 450 nm wavelength and 350 W power.
• Soft-contact and hard-contact alignment. Adjusting range between 0 to 50 mm.
• 10x Optical microscope with diffraction reducing optics.
• 5” (125mm) Cr mask adapter available.
• Substrate size: from 10 mm to 4” (100 mm), thicknesses between 0.1 to 4 mm.
• Minimum resolution: 1um.
• Exposure modes: fixed power or fixed intensity.

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U7-E02. ToF-SIMS (Time of the Flight Secondary Ion Mass Spectroscopy)

• ToF-SIMS (Time of the Flight Secondary Ion Mass Spectroscopy)

ION-TOF IV (IONTOF, Münster, Germany) equipped with the state-of-the –art Bi cluster primary ion gun for analysis, and O2 and Cs ion guns for sputtering in the depth profiling mode.
Charge compensation capability using a pulsed electron-gun and/or O2 flood gas allows surface analysis and depth profiling of highly insulating samples
Large sample stage capable of holding wafers up to 3″ in diameter/width and 0.5″ in thickness. Samples sizes from few mm up to 10cm. Motorized sample stage that allows for automated analysis of large areas. Heating/cooling stage.

• High mass resolution, to distinguish species of similar nominal mass (mass resolution is at least 0.00x amu); Particles with the same nominal mass (e.g. Si2 and Fe, both with amu = 56 ) can be clearly distinguish.
• Mass range of 0-10,000 amu; ions (positive or negative), isotopes, and molecular compounds (including polymers, organic compounds, and up to amino acids fragments) can be detected.
• High sensitivity for trace elements or compounds, on the order of ppm to ppb for most species;
• Elemental and chemical mapping on a sub-micron scale;
• Depth profiling capabilities; sequential sputtering of surfaces allow analysis of elemental composition on materials from 1nm up to 10µm in depth (typical sputtering rates are ~10nm/minute).
• Retrospective analysis. Every pixel of a ToF-SIMS map represents a full mass spectrum. This allows an analyst to retrospectively produce maps for any mass of interest, and to interrogate regions of interest (ROI) for their chemical composition via computer processing after the dataset has been instrumentally acquired.
• Surveys of all masses on material surfaces; these may include single ions (positive or negative), individual isotopes, and molecular compounds;
• Surface analysis of insulating and conducting samples;

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U7-E01. Ebeam/SEM (Nova NanoSEM 230/Raith)

• Nova NanoSEM 230

›› High and Low Vacuum field emission Scanning
Electron Microscope (SEM ) incorporating:

•• Resolution: 1.6 nm at 1 kV (ETD and TLD detectors) in High Vacuum.
•• Resolution: 1.8 nm at 3 kV (LVD detectors) in Low Vacuum.
•• Field emission filament -> High-resolution images even of non-conductive samples.
•• Backscattered electron detector (vCD detector):
High-resolution images of backscattered electrons.
•• 6-channel preamplifier for detectors of solid state.
•• Compressor.
•• Cryo Can, anti-contamination system.
•• Thermoflex closed wáter circuit.
›› Electron beam lithography system with:
•• High writing resolution (maximum speed of 6 MHz and control of the dwell time < 2 ns). •• Electrostatic Beam Blanker. •• Picoammeter exchanger box. •• Keithley picoammeter. •• Advanced nanolithography system for microscope. •• Beam Blanker amplification electronics •• Software for correcting the Proximity Effect. •• Universal sample carrier for Lithography. •• EBL Starter kit.

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U7-S10. Advising and consulting in micro and nanofabrication

Advising and consulting in micro and nanofabrication

The Advising and consulting in micro and nanofabrication service of U7, provides full support in the design of micro and nano fabrication processes for obtaining biomedical devices. We request deep information about the final application, technical needs, limitations, requirements, etc. and design, together with our clients, the best strategy for their fabrication projects.

Customer benefits

Our Advising and consulting in micro and nanofabrication service, benefits from being part of a bioengineering-specialized research centre, providing wide knowledge in the main applications and a large experience in the fabrication of biomedical devices in the field of bioengineering with different techniques and materials. We offer custom services, assuring close and direct interaction with the client, to meet conclusive results and high-quality needs.

Target customer

Our target customers are researchers in the field of bioengineering, or R&D departments of biotech companies which want to fabricate their custom biomedical prototypes or devices.

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U7-S09. Thin layer deposition

Thin layer deposition

The Thin Film Deposition service of U7, allows the integration of microelectronics in biomedical devices. Having four different deposition sources, being resistive evaporation, electron beam evaporation, DC sputtering and RF sputtering, this is a versatile equipment, due to the wide range of deposition techniques and materials available (Ti, Cr, Cu, Au, Al, ITO, SiOx and AlOx).

Customer benefits

Our Thin Film Deposition service benefits from being part of a bioengineering-specialized research centre, providing wide knowledge in the main applications of these methods and materials in the field of bioengineering. We offer custom services, assuring close and direct interaction with the client, to meet conclusive results and high-quality needs.

Target customer

Our target customers are researchers in the field of bioengineering and microelectronics, or R&D departments of biotech companies which want to test include microelectronics in their biomedical prototypes or devices.

Additional information

Imagen que contiene oscuro, verde, luz

Descripción generada automáticamente
Sputtered gold electrodes (100 nm thick), on a cover slip glass substrate. Image given by Dr. Mònica Mir from the “Nanobioengineering group” at IBEC.

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U7-S08. Fabrication of Chromium masks

Fabrication of Chromium masks

The Chromium mask fabrication service of U7 allows obtaining 5 inches chromium photomasks, with resolution as small as 1 µm for UV photolithography processes. The fabrication of high-resolution photomasks in-house, allows to speed up critical processes requiring masking and to have direct assistance in design for the targeted application.

Customer benefits

Our Chromium mask fabrication service benefits from being part of a bioengineering-specialized research centre, providing wide knowledge in the main applications of these masks in the field of bioengineering, as well as the main techniques that require the use of these type of masks. We offer custom services, assuring close and direct interaction with the client, to meet conclusive results and high-quality needs.

Target customer

Our target customers are researchers in the field of bioengineering or R&D departments of biotech companies which want to test biomedical devices or microstructured surfaces with bioengineering applications.

Additional information


Cr Mask for the fabrication of microfluidic devices.

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U7-S07. Photolithography and soft-lithography manufacturing processes

Photolithography and soft-lithography manufacturing processes

The Photolithography and soft-lithography service of U7, provides full support and assistance in the fabrication of biomedical devices, from design to the final chip. Clean room conditions, lithography tools (optical) and a variety of biocompatible polymers (soft-lithography) are employed for the creation of biomedical devices, as microfluidic chips for cell culture, diagnostic systems, etc.

Customer benefits

Our Photolithography and soft-lithography service benefits from being part of a bioengineering-specialized research centre, providing wide knowledge in the main applications and a large experience in the fabrication of these devices in the field of bioengineering. We offer custom services, assuring close and direct interaction with the client, to meet conclusive results and high-quality needs.

Target customer

Our target customers are researchers in the field of bioengineering, or R&D departments of biotech companies which want to test their custom biomedical prototypes or devices.

Additional information


SU-8 mould on 4” silicon wafer and PDMS microfluidic chip, fabricated from the same silicon mould.

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