U8. Micro – Nano Technology Unit
- Scientific Director: Prof. Jordi Aguiló email@example.com Dr. Rosa Villa firstname.lastname@example.org
- Scientific Coordinator: Dr. Gemma Gabriel email@example.com
- Entities: Instituto de Microelectrónica de Barcelona – Cenro Nacioal de Microelectrónica (IMB-CNM, CSIC)
- Address: Campus UAB, 08193, Cerdanyola del Vallés, Barcelona, Spain
- Phone: +34 935 947 700 ext. 1208
- Web: IMB – CNM, CSIC
This Micro-Nano Technologies Unit is located in the Microelectronic Institute of Barcelona, (IMB-CNM, CSIC) which is the largest installation with micro-nano technologies facilities in Spain. Its 1500 m2 Clean Room classes 10 to 10,000 are considered as Singular Scientific-Technical Infrastructure (ICTS). The platform is coordinated by Dr. Jordi Aguiló and this unit is based on a CVD (chemical vapor deposition) equipment for the controlled growth of carbon nanotubes (CNTs). The integration of the unit in the clean room facilities of the IMB-CNM enables a complete range of processes (thermal processes and CVD, metallization, photolithography, dry and wet etching) for the complete fabrication of MNBS devices. So, from the platform it is supported the whole MNBS fabrication steps: the customization of the technology needed, the design of the devices, the complete fabrication process, their encapsulation, the characterization and test up to the technological support on the experimental uses.
- U8-S01. Design, fabrication and encapsulation of microelectrodes (based on gold or platinum) on different rigid (Si, SiC or Pyrex) or flexible polymeric substrates (On-site&Remote) OUTSTANDING
- U8-S02. Electrochemical and electrical characterization of the above mentioned microelectrodes (On-site&Remote) OUTSTANDING
- U8-S03. Carbon Nanotubes growth services (On-site&Remote) OUTSTANDING
- U8-S04. Graphene growth services (On-site&Remote) OUTSTANDING
FOR THOSE SERVICES IDENTIFIED AS OUTSTANDING, AT LEAST 20% OF THEIR CAPACITY IS OPEN UNDER COMPETITIVE ACCESS. SEE ANNEX 1 OF ACCESS PROTOCOL FOR DETAILS ON % OF OPENNESS FOR EACH SERVICE
- U8-E01. Chemical vapor deposition (CVD) equipment for growth of CNTs and Graphene, Black Magic Pro 4-inch System ( AIXTRON Ltd)
Furthermore, in the IMB-CNM clean room (1500 m², Classes 10 to 10,000), there is also the following equipment, which is accessible under its own access policy:
- U8-E02. Thermal oxidation process equipment.
- U8-E03. Platinum and gold deposition equipment.
- U8-E04. Optical photolithography equipment.
- U8-E05. CVD nitride and oxide passivation equipment.
- U8-E06. Chemical banks for micro/nanotechnologies.
- U8-E07. RIE and DRIE equipment.
- U8-E08. Nanolithography equipment.
- U8-E09. Optical (SEM) and electrical (Impedance) characterization equipment.
- U8-E10. Encapsulation equipment.
|Title||Fundin: Organism||Call: Funding source||Role|
|GA: 696656||Graphene-based disruptive technologies — GrapheneCore1||Unión Europea (Comisión Europea)||H2020-Adhoc-2014-20||Partner|
|GA: 785219||Graphene Flagship Core Project-2 — GrapheneCore2’ ’||Unión Europea (Comisión Europea)||H202-SGA-FET-GRAPHENE-2017||Partner|
|GA: 649953||GRAPHENE FPA – FLAGSHIP - Graphene-based revolutions in ICT and beyond||Unión Europea (Comisión Europea)||H2020-FETFLAG-2014||Partner|
|SAF2017-90810-REDI||Strategic Promotion and coordinated management of Nanbiosis: Pronanbiosis II||Agencia Estatal de Investigación (AEI)||Acciones de dinamización «REDES DE EXCELENCIA» -ICTS 2017||Coordinator|
|Ref||Title||Funding Organism||Unit Role|
|SAF2014-62114-EXP||RUPTURE OF THE HEMATORRETINIAN BARRIER: CAUSE OR CONSEQUENCE OF THE DIABETIC RETINOPATHY?||MINECO||Others|
|BIO2014-61377-EXP||BIOLIVER: THE DECONSTRUCTION APPLIED TO HEPATOLOGY||MINECO||Others|
|H2020-Adhoc-2014-20 - 696656||GrapheneCore1||European Commission||Participant|
|FP7-ICT-2013-FET-F - 604391||Neurographene: Neurological Recordings with Graphene||EUROPEAN COMISSION||Others|
|IMI Grant agreement No 115902||Remote Assessment of Disease and Relapse in Central Nervous System Disorders (RADAR-CNS)||Others|
- Moya A., Sowade E., del Campo F.J., Mitra K.Y., Ramon E., Villa R. et al. All-inkjet-printed dissolved oxygen sensors on flexible plastic substrates. Organic Electronics: physics, materials, applications. 2016;39:168-176.
- Yeste J., Illa X., Gutierrez C., Sole M., Guimera A., Villa R.. Geometric correction factor for transepithelial electrical resistance measurements in transwell and microfluidic cell cultures. Journal of Physics D: Applied Physics. 2016;49(37):-.
- Hernando A., Lazaro J., Gil E., Arza A., Garzon J.M., Lopez-Anton R. et al. Inclusion of Respiratory Frequency Information in Heart Rate Variability Analysis for Stress Assessment. IEEE Journal of Biomedical and Health Informatics. 2016;20(4):1016-1025.
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